International Residual Mechanism for Criminal Tribunals
Experience: Internship
Skill Required: HR and Admin
Apply By: 03-11-2022
The Human Resources Section of the United Nations International Residual Mechanism for Criminal Tribunals (“Mechanism”) invites applications for internships starting 22 August 2022 in The Hague, Netherlands. This job opening will be valid for 6 months and candidates will be selected on a rolling basis. The duration of the internship generally ranges from three months to six months. Please indicate your preferred internship period in your cover letter.
The Mechanism is mandated to perform a number of essential functions previously carried out by the International Criminal Tribunal for Rwanda and the International Criminal Tribunal for the former Yugoslavia. In carrying out these essential functions the Mechanism maintains the legacies of these two pioneering ad hoc international criminal courts and strives to reflect best practices in the field of international criminal justice.
Responsibilities:
Under the supervision and direction of the Chief of the Human Resources Section, the Intern may be required to: process applications for vacancies; maintain vacancy announcement files and track status of vacancy announcements; assist in the evaluation and screening of applications of candidates; circulate weekly update of vacancies posted; follow up on reference checking; arrange and schedule interviews; provide general office support services; draft and/or process a variety of correspondence and other communications; schedule appointments/meetings, monitor deadlines; maintain automated databases containing HR related statistics and prepare periodic reports; assist in the administration and updating of the Personnel Information Management Systems (PIMS); prepare documents for archiving. Additionally, the Intern will assist the Human Resources Administration with ad-hoc duties when necessary.
Education:
Applicants must meet one of the following requirements:
Job - Specific Qualification:
Work Experience:
Languages: